Follow
Alex Dommann
Alex Dommann
Verified email at unibe.ch - Homepage
Title
Cited by
Cited by
Year
Clinical applications of glass-ceramics in dentistry
W Höland, V Rheinberger, E Apel, C van’t Hoen, M Höland, A Dommann, ...
Journal of Materials Science: Materials in Medicine 17 (11), 1037-1042, 2006
2372006
Silicon epitaxy by low-energy plasma enhanced chemical vapor deposition
C Rosenblad, HR Deller, A Dommann, T Meyer, P Schroeter, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (5 …, 1998
1851998
Thermal-mismatch-strain relaxation in epitaxial , /, and PbSe// layers on Si(111) after many temperature cycles
H Zogg, S Blunier, A Fach, C Maissen, P Müller, S Teodoropol, V Meyer, ...
Physical Review B 50 (15), 10801, 1994
1531994
A plasma process for ultrafast deposition of SiGe graded buffer layers
C Rosenblad, H Känel, M Kummer, A Dommann, E Müller
Applied Physics Letters 76 (4), 427-429, 2000
1002000
Lattice strain and defects analysis in nanostructured semiconductor materials and devices by high‐resolution X‐ray diffraction: theoretical and practical aspects
S Dolabella, A Borzì, A Dommann, A Neels
Small Methods 6 (2), 2100932, 2022
992022
Hydrogen plasma chemical cleaning of metallic substrates and silicon wafers
N Korner, E Beck, A Dommann, N Onda, J Ramm
Surface and Coatings Technology 76, 731-737, 1995
961995
Low energy plasma enhanced chemical vapor deposition
M Kummer, C Rosenblad, A Dommann, T Hackbarth, G Höck, M Zeuner, ...
Materials Science and Engineering: B 89 (1-3), 288-295, 2002
942002
Process influences on the structure, piezoelectric, and gas‐barrier properties of PVDF‐TrFE copolymer
F Oliveira, Y Leterrier, JA Månson, O Sereda, A Neels, A Dommann, ...
Journal of Polymer Science Part B: Polymer Physics 52 (7), 496-506, 2014
842014
Influence of low oxygen contents and alloy refinement on the glass forming ability of Zr52. 5Cu17. 9Ni14. 6Al10Ti5
AA Kündig, D Lepori, AJ Perry, S Rossmann, A Blatter, A Dommann, ...
Materials Transactions 43 (12), 3206-3210, 2002
732002
Thermal Stability of Thin Film Corundum‐Type Solid Solutions of (Al1–xCrx)2O3 Synthesized Under Low‐Temperature Non‐Equilibrium Conditions
J Ramm, M Ante, H Brändle, A Neels, A Dommann, M Döbeli
Advanced Engineering Materials 9 (7), 604-608, 2007
692007
Magnetic properties and antiferromagnetic Cu ordering in Pr2CuO4
P Allenspach, SW Choeng, A Dommann, P Fischer, Z Fisk, A Furrer, ...
Zeitschrift für Physik B Condensed Matter 77, 185-191, 1989
691989
Casting of amorphous metallic parts by hot mold quenching
AA Kündig, WL Johnson, A Dommann
US Patent 6,620,264, 2003
662003
Near infrared image sensor with integrated germanium photodiodes.
R Kaufmann, G Isella, A Sanchez-Amores, S Neukom, A Neels, ...
Journal of Applied Physics 110 (2), 2011
642011
Factors controlling the incubation in the application of ps laser pulses on copper and iron surfaces
B Neuenschwander, B Jaeggi, M Schmid, A Dommann, A Neels, T Bandi, ...
Laser Applications in Microelectronic and Optoelectronic Manufacturing …, 2013
632013
Orientation-selective X-ray dark field imaging of ordered systems
V Revol, C Kottler, R Kaufmann, A Neels, A Dommann
Journal of Applied Physics 112 (11), 2012
602012
Nylon-6/chitosan core/shell antimicrobial nanofibers for the prevention of mesh-associated surgical site infection
A Keirouz, N Radacsi, Q Ren, A Dommann, G Beldi, K Maniura-Weber, ...
Journal of nanobiotechnology 18, 1-17, 2020
582020
Correlation between target surface and layer nucleation in the synthesis of Al–Cr–O coatings deposited by reactive cathodic arc evaporation
J Ramm, A Neels, B Widrig, M Döbeli, L de Abreu Vieira, A Dommann, ...
Surface and Coatings Technology 205 (5), 1356-1361, 2010
562010
Biaxial scanning mirror activated by bimorph structures for medical applications
RA Buser, NF De Rooij, H Tischhauser, A Dommann, G Staufert
Sensors and Actuators A: Physical 31 (1-3), 29-34, 1992
531992
The crystal structure and some properties of CePt2Si2 and CePt2Ge2
A Dommann, F Hulliger, HR Ott, V Gramlich
Journal of the Less Common Metals 110 (1-2), 331-337, 1985
521985
Hydrogen cleaning of silicon wafers. Investigation of the wafer surface after plasma treatment
J Ramm, E Beck, A Zueger, A Dommann, RE Pixley
Thin Solid Films 228 (1-2), 23-26, 1993
441993
The system can't perform the operation now. Try again later.
Articles 1–20