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Huan-Lin Chang
Huan-Lin Chang
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Cited by
Year
Compact models of negative-capacitance FinFETs: Lumped and distributed charge models
JP Duarte, S Khandelwal, AI Khan, A Sachid, YK Lin, HL Chang, ...
2016 IEEE International Electron Devices Meeting (IEDM), 30.5. 1-30.5. 4, 2016
1012016
Engineering negative differential resistance in NCFETs for analog applications
H Agarwal, P Kushwaha, JP Duarte, YK Lin, AB Sachid, MY Kao, ...
IEEE Transactions on Electron Devices 65 (5), 2033-2039, 2018
1002018
Stress-induced hump effects of p-channel polycrystalline silicon thin-film transistors
CF Huang, CY Peng, YJ Yang, HC Sun, HC Chang, PS Kuo, HL Chang, ...
IEEE Electron Device Letters 29 (12), 1332-1335, 2008
712008
Variation caused by spatial distribution of dielectric and ferroelectric grains in a negative capacitance field-effect transistor
MY Kao, AB Sachid, YK Lin, YH Liao, H Agarwal, P Kushwaha, JP Duarte, ...
IEEE Transactions on Electron Devices 65 (10), 4652-4658, 2018
392018
Designing 0.5 V 5-nm HP and 0.23 V 5-nm LP NC-FinFETs With Improved Sensitivity in Presence of Parasitic Capacitance
H Agarwal, P Kushwaha, JP Duarte, YK Lin, AB Sachid, HL Chang, ...
IEEE Transactions on Electron Devices 65 (3), 1211-1216, 2018
332018
Physical mechanism of HfO2-based bipolar resistive random access memory
HL Chang, HC Li, CW Liu, F Chen, MJ Tsai
Proceedings of 2011 International Symposium on VLSI Technology, Systems and …, 2011
302011
BSIM-HV: High-voltage MOSFET model including quasi-saturation and self-heating effect
H Agarwal, C Gupta, R Goel, P Kushwaha, YK Lin, MY Kao, JP Duarte, ...
IEEE Transactions on Electron Devices 66 (10), 4258-4263, 2019
252019
Coupling effects of dual SiGe power amplifiers for 802.11 n MIMO applications
WC Hua, PT Lin, CP Lin, CY Lin, HL Chang, CW Liu, TY Yang, GK Ma
IEEE Radio Frequency Integrated Circuits (RFIC) Symposium, 2006, 4 pp., 2006
232006
A predictive tunnel FET compact model with atomistic simulation validation
YK Lin, S Khandelwal, JP Duarte, HL Chang, S Salahuddin, C Hu
IEEE Transactions on Electron Devices 64 (2), 599-605, 2016
222016
Effect of polycrystallinity and presence of dielectric phases on NC-FinFET variability
YK Lin, MY Kao, H Agarwal, YH Liao, P Kushwaha, K Chatterjee, ...
2018 IEEE International Electron Devices Meeting (IEDM), 9.4. 1-9.4. 4, 2018
182018
Modeling of advanced RF bulk FinFETs
P Kushwaha, H Agarwal, YK Lin, MY Kao, JP Duarte, HL Chang, W Wong, ...
IEEE Electron Device Letters 39 (6), 791-794, 2018
162018
Compact modeling source-to-drain tunneling in sub-10-nm GAA FinFET with industry standard model
YK Lin, JP Duarte, P Kushwaha, H Agarwal, HL Chang, A Sachid, ...
IEEE Transactions on Electron Devices 64 (9), 3576-3581, 2017
162017
Modeling of Subsurface Leakage Current in LowShort Channel MOSFET at Accumulation Bias
YK Lin, S Khandelwal, AS Medury, H Agarwal, HL Chang, YS Chauhan, ...
IEEE Transactions on Electron Devices 63 (5), 1840-1845, 2016
162016
Modeling of back-gate effects on gate-induced drain leakage and gate currents in UTB SOI MOSFETs
YK Lin, P Kushwaha, H Agarwal, HL Chang, JP Duarte, AB Sachid, ...
IEEE Transactions on Electron Devices 64 (10), 3986-3990, 2017
152017
Negative-capacitance FinFETs: Numerical simulation, compact modeling and circuit evaluation
JP Duarte, YK Lin, YH Liao, A Sachid, MY Kao, H Agarwal, P Kushwaha, ...
2018 International conference on simulation of semiconductor processes and …, 2018
132018
BSIM-BULK 106.2. 0 MOSFET Compact Model Technical Manual
H Agarwal, C Gupta, HL Chang, S Khandelwal, JP Duarte, YS Chauhan, ...
Univ. California, Berkeley, 2017
122017
Improved SPICE macromodel of phase change random access memory
HL Chang, HC Chang, SC Yang, HC Tsai, HC Li, CW Liu
2009 International Symposium on VLSI Design, Automation and Test, 134-137, 2009
102009
BSIM-BULK106. 2.0 Technical Manual
H Agarwal, C Gupta, SKH Chang, JP Duarte, YS Chauhan, S Salahuddin, ...
University of California, Berkeley, CA, USA.[Online]. Available: http://bsim …, 2017
92017
Modeling of GeOI and validation with Ge-CMOS inverter circuit using BSIM-IMG industry standard model
H Agarwal, P Kushwaha, YS Chauhan, S Khandelwal, JP Duarte, YK Lin, ...
2016 IEEE International Conference on Electron Devices and Solid-State …, 2016
92016
New mobility model for accurate modeling of transconductance in FDSOI MOSFETs
YK Lin, P Kushwaha, JP Duarte, HL Chang, H Agarwal, S Khandelwal, ...
IEEE Transactions on Electron Devices 65 (2), 463-469, 2018
82018
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