| Acid catalyst mobility in resist resins MD Stewart, HV Tran, GM Schmid, TB Stachowiak, DJ Becker, CG Willson Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 128 | 2002 |
| Implementation of an imprint damascene process for interconnect fabrication GM Schmid, MD Stewart, J Wetzel, F Palmieri, J Hao, Y Nishimura, K Jen, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006 | 102 | 2006 |
| Spatial distribution of reaction products in positive tone chemically amplified resists GM Schmid, MD Stewart, VK Singh, CG Willson Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 59 | 2002 |
| Step and flash imprint lithography for manufacturing patterned media GM Schmid, M Miller, C Brooks, N Khusnatdinov, D LaBrake, DJ Resnick, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 54 | 2009 |
| Direct imprinting of dielectric materials for dual damascene processing MD Stewart, JT Wetzel, GM Schmid, F Palmieri, E Thompson, EK Kim, ... Emerging Lithographic Technologies IX 5751, 210-218, 2005 | 53 | 2005 |
| Real-time dynamic single-molecule protein sequencing on an integrated semiconductor device BD Reed, MJ Meyer, V Abramzon, O Ad, O Ad, P Adcock, FR Ahmad, ... Science 378 (6616), 186-192, 2022 | 51 | 2022 |
| Advancements to the critical ionization dissolution model SD Burns, GM Schmid, PC Tsiartas, CG Willson, L Flanagin Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 50 | 2002 |
| Whole wafer imprint patterning using step and flash imprint lithography: a manufacturing solution for sub-100-nm patterning D Lentz, G Doyle, M Miller, G Schmidt, M Ganapathisuramanian, X Lu, ... Emerging Lithographic Technologies XI 6517, 714-723, 2007 | 47 | 2007 |
| Resolution limitations in chemically amplified photoresist systems GM Schmid, MD Stewart, CY Wang, BD Vogt, VM Prabhu, EK Lin, ... Advances in Resist Technology and Processing XXI 5376, 333-342, 2004 | 46 | 2004 |
| Nonaqueous development of silsesquioxane electron beam resist GM Schmid, LE Carpenter, JA Liddle Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 45 | 2004 |
| Understanding molecular-level effects during post-exposure processing GM Schmid, MD Smith, CA Mack, VK Singh, SD Burns, CG Willson Advances in Resist Technology and Processing XVIII 4345, 1037-1047, 2001 | 44 | 2001 |
| Effects of etch barrier densification on step and flash imprint lithography S Johnson, R Burns, EK Kim, M Dickey, G Schmid, J Meiring, S Burns, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 41 | 2005 |
| Electrochemical etching of silicon in nonaqueous electrolytes containing hydrogen fluoride or fluoroborate JC Flake, MM Rieger, GM Schmid, PA Kohl Journal of The Electrochemical Society 146 (5), 1960, 1999 | 40 | 1999 |
| Mesoscale modeling for SFIL simulating polymerization kinetics and densification RL Burns, SC Johnson, GM Schmid, EK Kim, MD Dickey, J Meiring, ... Emerging Lithographic Technologies Viii 5374, 348-360, 2004 | 38 | 2004 |
| Asymmetric templates for forming non-periodic patterns using directed self-assembly materials GM Schmid, RA Farrell, J Xu, JR Cantone, ME Preil US Patent 8,956,808, 2015 | 32 | 2015 |
| Toward 22 nm for unit process development using step and flash imprint lithography GM Schmid, E Thompson, N Stacey, DJ Resnick, DL Olynick, ... Emerging Lithographic Technologies XI 6517, 378-386, 2007 | 32 | 2007 |
| Nanostructured solar cell S Yang, MN Miller, MM Hilali, F Wan, GM Schmid, L Wang, ... US Patent 9,070,803, 2015 | 31 | 2015 |
| Jet and flash imprint lithography for the fabrication of patterned media drives GM Schmid, C Brooks, Z Ye, S Johnson, D LaBrake, SV Sreenivasan, ... Photomask Technology 2009 7488, 583-594, 2009 | 31 | 2009 |
| Self-aligned process for fabricating imprint templates containing variously etched features GM Schmid, NA Stacey, DJ Resnick, RD Voisin, LJ Myron US Patent 7,547,398, 2009 | 31 | 2009 |
| Fabrication of 28nm pitch Si fins with DSA lithography G Schmid, R Farrell, J Xu, C Park, M Preil, V Chakrapani, N Mohanty, ... Alternative Lithographic Technologies V 8680, 310-321, 2013 | 28 | 2013 |
