Raphael Ramos
Raphael Ramos
researcher, CEA LITEN (Grenoble)
Verified email at cea.fr
Title
Cited by
Cited by
Year
New chamber walls conditioning and cleaning strategies to improve the stability of plasma processes
G Cunge, B Pelissier, O Joubert, R Ramos, C Maurice
Plasma Sources Science and Technology 14 (3), 599, 2005
862005
Etching mechanisms of , , and poly-Si substrates in plasmas
E Sungauer, E Pargon, X Mellhaoui, R Ramos, G Cunge, L Vallier, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
582007
No cytotoxicity or genotoxicity of graphene and graphene oxide in murine lung epithelial FE1 cells in vitro
S Bengtson, K Kling, AM Madsen, AW Noergaard, NR Jacobsen, ...
Environmental and molecular mutagenesis 57 (6), 469-482, 2016
532016
Radical surface interactions in industrial silicon plasma etch reactors
G Cunge, D Vempaire, R Ramos, M Touzeau, O Joubert, P Bodard, ...
Plasma Sources Science and Technology 19 (3), 034017, 2010
502010
Cleaning aluminum fluoride coatings from plasma reactor walls in SiCl4/Cl2 plasmas
R Ramos, G Cunge, B Pelissier, O Joubert
Plasma Sources Science and Technology 16 (4), 711, 2007
432007
Gas temperature measurement in , , , , and HBr inductively coupled plasmas
G Cunge, R Ramos, D Vempaire, M Touzeau, M Neijbauer, N Sadeghi
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 27 (3 …, 2009
422009
Enhanced ionic liquid mobility induced by confinement in 1D CNT membranes
Q Berrod, F Ferdeghini, P Judeinstein, N Genevaz, R Ramos, A Fournier, ...
Nanoscale 8 (15), 7845-7848, 2016
392016
Influence of the reactor wall composition on radicals’ densities and total pressure in inductively coupled plasmas: II. During silicon etching
G Cunge, N Sadeghi, R Ramos
Journal of Applied Physics 102 (9), 093305, 2007
392007
Influence of the reactor wall composition on radicals' densities and total pressure in inductively coupled plasmas: I. Without silicon etching
G Cunge, N Sadeghi, R Ramos
Journal of Applied Physics 102 (9), 093304, 2007
382007
Plasma/reactor walls interactions in advanced gate etching processes
R Ramos, G Cunge, O Joubert, N Sadeghi, M Mori, L Vallier
Thin Solid Films 515 (12), 4846-4852, 2007
322007
A survey of carbon nanotube interconnects for energy efficient integrated circuits
A Todri-Sanial, R Ramos, H Okuno, J Dijon, A Dhavamani, M Widlicenus, ...
IEEE Circuits and Systems Magazine 17 (2), 47-62, 2017
242017
Vertically-aligned carbon nanotubes on aluminum as a light-weight positive electrode for lithium-polysulfide batteries
S Liatard, K Benhamouda, A Fournier, R Ramos, C Barchasz, J Dijon
Chemical communications 51 (36), 7749-7752, 2015
232015
Near-field artifacts in tip-enhanced Raman spectroscopy
R Ramos, MJ Gordon
Applied Physics Letters 100 (21), 213111, 2012
202012
Absorption spectroscopy in BCl3 inductively coupled plasmas: determination of density, rotational, translational and vibrational temperatures of BCl molecule
R Ramos, G Cunge, M Touzeau, N Sadeghi
Journal of Physics D: Applied Physics 41 (11), 115205, 2008
182008
On the interest of carbon-coated plasma reactor for advanced gate stack etching processes
R Ramos, G Cunge, O Joubert
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 25 (2 …, 2007
182007
Measured velocity distribution of sputtered Al atoms perpendicular and parallel to the target
R Ramos, G Cunge, M Touzeau, N Sadeghi
Journal of Physics D: Applied Physics 41 (15), 152003, 2008
172008
Plasma reactor dry cleaning strategy after TiN, TaN and etching processes
R Ramos, G Cunge, O Joubert
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
162008
High-yield, in-situ fabrication and integration of horizontal carbon nanotube arrays at the wafer scale for robust ammonia sensors
H Guerin, H Le Poche, R Pohle, LS Bernard, E Buitrago, R Ramos, ...
Carbon 78, 326-338, 2014
142014
Revisiting the mechanisms involved in Line Width Roughness smoothing of 193 nm photoresist patterns during HBr plasma treatment
M Brihoum, R Ramos, K Menguelti, G Cunge, E Pargon, O Joubert
Journal of Applied Physics 113 (1), 013302, 2013
132013
Plasma treatments to improve line-width roughness during gate patterning
LM Azarnouche, E Pargon, K Menguelti, M Fouchier, M Brihoum, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (4), 041304, 2013
112013
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