| Measurement of lower-hybrid drift turbulence in a reconnecting current sheet TA Carter, H Ji, F Trintchouk, M Yamada, RM Kulsrud Physical review letters 88 (1), 015001, 2001 | 141 | 2001 |
| Experimental investigation of the neutral sheet profile during magnetic reconnection M Yamada, H Ji, S Hsu, T Carter, R Kulsrud, F Trintchouk Physics of Plasmas 7 (5), 1781-1787, 2000 | 109 | 2000 |
| Experimental study of lower-hybrid drift turbulence in a reconnecting current sheet TA Carter, M Yamada, H Ji, RM Kulsrud, F Trintchouk Physics of Plasmas 9 (8), 3272-3288, 2002 | 82 | 2002 |
| Measurement of the transverse Spitzer resistivity during collisional magnetic reconnection F Trintchouk, M Yamada, H Ji, RM Kulsrud, TA Carter Physics of Plasmas 10 (1), 319-322, 2003 | 79 | 2003 |
| Visualization of plasma turbulence with laser-induced fluorescence FM Levinton, F Trintchouk Review of Scientific Instruments 72 (1), 898-905, 2001 | 29 | 2001 |
| High power high pulse repetition rate gas discharge laser system bandwidth management RL Sandstrom, WN Partlo, DJW Brown, JM Algots, F Trintchouk | 28 | 2006 |
| Impact of finite laser bandwidth on the critical dimension of L/S structures P De Bisschop, I Lalovic, F Trintchouk Journal of Micro/Nanolithography, MEMS and MOEMS 7 (3), 033001-033001-16, 2008 | 26 | 2008 |
| Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography VB Fleurov, DJ Colon III, DJW Brown, P O'Keeffe, H Besaucele, AI Ershov, ... Optical Microlithography XVI 5040, 1694-1703, 2003 | 26 | 2003 |
| Method and apparatus for gas discharge laser bandwidth and center wavelength control FB Trintchouk, RN Jacques US Patent 7,643,522, 2010 | 25 | 2010 |
| Automatic gas control system for a gas discharge laser JA Rule, RC Morton, VV Fleurov, F Trintchouk, T Ishihara, AI Ershov, ... US Patent 6,963,595, 2005 | 25 | 2005 |
| XLR 600i: recirculating ring ArF light source for double patterning immersion lithography V Fleurov, S Rokitski, R Bergstedt, H Ye, K O’Brien, R Jacques, ... Optical Microlithography XXI 6924, 618-622, 2008 | 21 | 2008 |
| Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control HA Besaucele, WJ Dunstan, T Ishihara, RN Jacques, FB Trintchouk US Patent 7,741,639, 2010 | 20 | 2010 |
| Active spectral control of DUV light source WJ Dunstan, RN Jacques, RM Rao, FB Trintchouk US Patent 7,852,889, 2010 | 19 | 2010 |
| Gas discharge laser output light beam parameter control HA Besaucele, IV Fomenkov, WN Partlo, FB Trintchouk, HT That US Patent 7,471,708, 2008 | 19 | 2008 |
| Active Spectral Control of DUV light sources for OPE minimization WJ Dunstan, R Jacques, RJ Rafac, R Rao, F Trintchouk Optical Microlithography XIX 6154, 850-858, 2006 | 17 | 2006 |
| XLA-300: the fourth-generation ArF MOPA light source for immersion lithography F Trintchouk, T Ishihara, W Gillespie, R Ness, R Bergstedt, C Wittak, ... Optical Microlithography XIX 6154, 719-727, 2006 | 10 | 2006 |
| Method and apparatus for controlling light bandwidth KM O'brien, FB Trintchouk US Patent 8,837,536, 2014 | 8 | 2014 |
| Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source R Rokitski, V Fleurov, R Bergstedt, H Ye, R Rafac, R Jacques, ... Optical Microlithography XXII 7274, 1170-1177, 2009 | 7 | 2009 |
| Production-ready 4-kHz ArF laser for 193-nm lithography C Oh, VB Fleurov, T Hofmann, TP Duffey, F Trintchouk, P O'Keeffe, ... Optical Microlithography XV 4691, 1753-1760, 2002 | 7 | 2002 |
| Phys. Plasmas TA Carter, M Yamada, H Ji, RM Kulsrud, F Trintchouk Phys. Plasmas 9 (5097), 2002 | 7 | 2002 |
