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Marcus Morstein
Marcus Morstein
Leiter Werkstoff- und Nanotechnologien, Hightech Zentrum Aargau
Bestätigte E-Mail-Adresse bei hightechzentrum.ch - Startseite
Titel
Zitiert von
Zitiert von
Jahr
Plasma-CVD-coated glass beads as photocatalyst for water decontamination
M Karches, M Morstein, PR Von Rohr, RL Pozzo, JL Giombi, MA Baltanás
Catalysis Today 72 (3-4), 267-279, 2002
1852002
Fracture mechanisms in nanoscale layered hard thin films
A Karimi, Y Wang, T Cselle, M Morstein
Thin solid films 420, 275-280, 2002
1352002
Characterization of tribological behavior and wear mechanisms of novel oxynitride PVD coatings designed for applications at high temperatures
J Nohava, P Dessarzin, P Karvankova, M Morstein
Tribology International 81, 231-239, 2015
1062015
Development of novel coating technology by vacuum arc with rotating cathodes for industrial production of nc-(Al 1− x Ti x) N/a-Si 3 N 4 superhard nanocomposite coatings for …
M Jilek, T Cselle, P Holubar, M Morstein, MGJ Veprek-Heijman, S Veprek
Plasma chemistry and plasma processing 24, 493-510, 2004
842004
Volatile β-ketoiminato-and β-diketiminato-based zirconium complexes as potential MOCVD precursors
PL Franceschini, M Morstein, H Berke, HW Schmalle
Inorganic chemistry 42 (22), 7273-7282, 2003
782003
Correlation between anionic substitution and structural properties in AlCr (OxN1− x) coatings deposited by lateral rotating cathode arc PVD
H Najafi, A Karimi, P Dessarzin, M Morstein
Thin Solid Films 520 (5), 1597-1602, 2011
732011
Formation of cubic structured (Al1− xCrx) 2+ δO3 and its dynamic transition to corundum phase during cathodic arc evaporation
H Najafi, A Karimi, P Dessarzin, M Morstein
Surface and Coatings Technology 214, 46-52, 2013
652013
ZrN, ZrxAlyN and ZrxGayN thin films–novel materials for hard coatings grown using pulsed laser deposition
H Spillmann, PR Willmott, M Morstein, PJ Uggowitzer
Applied Physics A 73, 441-450, 2001
642001
Characterization of thermally treated TiAlSiN coatings by TEM and nanoindentation
M Parlinska-Wojtan, A Karimi, O Coddet, T Cselle, M Morstein
Surface and Coatings Technology 188, 344-350, 2004
622004
On the behaviour of indentation fracture in TiAlSiN hard thin films
O Nakonechna, T Cselle, M Morstein, A Karimi
Thin Solid Films 447, 406-412, 2004
612004
Small-scale fracture toughness of ceramic thin films: the effects of specimen geometry, ion beam notching and high temperature on chromium nitride toughness evaluation
JP Best, J Zechner, JM Wheeler, R Schoeppner, M Morstein, J Michler
Philosophical Magazine 96 (32-34), 3552-3569, 2016
602016
Triplecoatings3®-New generation of PVD-Coatings for cutting tools
T Cselle, O Coddet, C Galamand, P Holubar, M Jilek, J Jilek, ...
Journal of machine manufacturing 49 (E1), 19-25, 2009
562009
Conventional and high resolution TEM investigation of the microstructure of compositionally graded TiAlSiN thin films
M Parlinska-Wojtan, A Karimi, T Cselle, M Morstein
Surface and Coatings Technology 177, 376-381, 2004
552004
Deformation of hard coatings at elevated temperatures
JM Wheeler, R Raghavan, V Chawla, M Morstein, J Michler
Surface and Coatings Technology 254, 382-387, 2014
502014
A comparison of three different notching ions for small-scale fracture toughness measurement
JP Best, J Zechner, I Shorubalko, JV Oboňa, J Wehrs, M Morstein, ...
Scripta Materialia 112, 71-74, 2016
462016
Composition and Microstructure of Zirconia Films Obtained by MOCVD with a New, Liquid, Mixed Acetylacetonato‐Alcoholato Precursor
M Morstein, I Pozsgai, ND Spencer
Chemical Vapor Deposition 5 (4), 151-158, 1999
431999
Plasma CVD of Ultrathin TiO2 Films on Powders in a Circulating Fluidized Bed
M Morstein, M Karches, C Bayer, D Casanova, PR von Rohr
Chemical vapor deposition 6 (1), 16-20, 2000
422000
Surface inorganic chemistry: The reaction of hydroxyl-terminated thiols on gold with a zirconium coordination compound
C Dicke, M Morstein, G Hähner
Langmuir 18 (2), 336-344, 2002
332002
Volatile zirconium bis (acetylacetonato) bis (alcoholato) complexes containing heterosubstituted alcoholato ligands
M Morstein
Inorganic Chemistry 38 (1), 125-131, 1999
331999
New Single‐Source Precursors for the MOCVD of High‐κ Dielectric Zirconium Silicates to Replace SiO2 in Semiconducting Devices
S Zürcher, M Morstein, ND Spencer, M Lemberger, A Bauer
Chemical Vapor Deposition 8 (4), 171-177, 2002
322002
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