| Atomic inner-shell X-ray laser at 1.46 nanometres pumped by an X-ray free-electron laser N Rohringer, D Ryan, RA London, M Purvis, F Albert, J Dunn, JD Bozek, ... Nature 481 (7382), 488-491, 2012 | 424 | 2012 |
| Relativistic plasma nanophotonics for ultrahigh energy density physics MA Purvis, VN Shlyaptsev, R Hollinger, C Bargsten, A Pukhov, A Prieto, ... Nature photonics 7 (10), 796-800, 2013 | 211 | 2013 |
| Stimulated electronic x-ray Raman scattering C Weninger, M Purvis, D Ryan, RA London, JD Bozek, C Bostedt, A Graf, ... Physical review letters 111 (23), 233902, 2013 | 154 | 2013 |
| Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling I Fomenkov, D Brandt, A Ershov, A Schafgans, Y Tao, G Vaschenko, ... Advanced Optical Technologies 6 (3-4), 173-186, 2017 | 122 | 2017 |
| EUV lithography performance for manufacturing: status and outlook A Pirati, R Peeters, D Smith, S Lok, M van Noordenburg, R van Es, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 78-92, 2016 | 121 | 2016 |
| Performance optimization of MOPA pre-pulse LPP light source AA Schafgans, DJ Brown, IV Fomenkov, R Sandstrom, A Ershov, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 56-66, 2015 | 54 | 2015 |
| Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W M Purvis, IV Fomenkov, AA Schafgans, M Vargas, S Rich, Y Tao, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 476-485, 2018 | 44 | 2018 |
| Dynamics of a dense laboratory plasma jet investigated using soft x-ray laser interferometry J Grava, MA Purvis, J Filevich, MC Marconi, JJ Rocca, J Dunn, SJ Moon, ... Physical Review E 78 (1), 016403, 2008 | 37 | 2008 |
| Dynamics of converging laser-created plasmas in semicylindrical cavities studied using soft x-ray laser interferometry M Purvis, J Grava, J Filevich, MC Marconi, J Dunn, SJ Moon, ... Physical Review E 76 (4), 046402, 2007 | 31 | 2007 |
| Radiation transport and scaling of optical depth in Nd: YAG laser-produced microdroplet-tin plasma R Schupp, F Torretti, RA Meijer, M Bayraktar, J Sheil, J Scheers, ... Applied Physics Letters 115 (12), 2019 | 29 | 2019 |
| Prediction and observation of tin and silver plasmas with index of refraction greater than one in the soft x-ray range J Filevich, J Grava, M Purvis, MC Marconi, JJ Rocca, J Nilsen, J Dunn, ... Physical Review E 74 (1), 016404, 2006 | 22 | 2006 |
| Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation) AA Schafgans, DJ Brown, IV Fomenkov, Y Tao, M Purvis, SI Rokitski, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 330-330, 2017 | 19 | 2017 |
| High resolution soft x-ray spectroscopy of low Z K-shell emission from laser-produced plasmas J Dunn, EW Magee, R Shepherd, H Chen, SB Hansen, SJ Moon, ... Review of Scientific Instruments 79 (10), 2008 | 18 | 2008 |
| Multiply ionized carbon plasmas with index of refraction greater than one J Filevich, J Grava, M Purvis, MC Marconi, JJ Rocca, J Nilsen, J Dunn, ... Laser and Particle Beams 25 (1), 47-51, 2007 | 18 | 2007 |
| Collimation of dense plasma jets created by low-energy laser pulses and studied with soft x-ray laser interferometry MA Purvis, J Grava, J Filevich, DP Ryan, SJ Moon, J Dunn, VN Shlyaptsev, ... Physical Review E 81 (3), 036408, 2010 | 17 | 2010 |
| Nat. Photonics 7, 796 (2013) MA Purvis, VN Shlyaptsev, R Hollinger, C Bargsten, A Pukhov, A Prieto, ... | 15 | |
| Laser produced plasma light source development for HVM IV Fomenkov, DC Brandt, NR Farrar, B La Fontaine, DW Myers, DJ Brown, ... Extreme Ultraviolet (EUV) Lithography V 9048, 755-760, 2014 | 12 | 2014 |
| Extreme ultraviolet light source Y Tao, JT Stewart IV, J Jur, A LaForge, D Brown, JM Arcand, ... US Patent 9,357,625, 2016 | 11 | 2016 |
| Advancements in predictive plasma formation modeling MA Purvis, A Schafgans, DJW Brown, I Fomenkov, R Rafac, J Brown, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 159-170, 2016 | 11 | 2016 |
| EUV light source for high-NA and low-NA lithography K Umstadter, M Graham, M Purvis, A Schafgans, J Stewart, P Mayer, ... Optical and EUV Nanolithography XXXVI 12494, 335-342, 2023 | 10 | 2023 |
Jorge FilevichThermo Fisher ScientificBestätigte E-Mail-Adresse bei engr.colostate.edu
