| Time-dependent dielectric breakdown of plasma-exposed porous organosilicate glass MT Nichols, H Sinha, CA Wiltbank, GA Antonelli, Y Nishi, JL Shohet Applied Physics Letters 100 (11), 2012 | 41 | 2012 |
| Charge trapping within UV and vacuum UV irradiated low-k porous organosilicate dielectrics JL Lauer, H Sinha, MT Nichols, GA Antonelli, Y Nishi, JL Shohet Journal of The Electrochemical Society 157 (8), G177, 2010 | 41 | 2010 |
| The effects of vacuum ultraviolet radiation on low-k dielectric films H Sinha, H Ren, MT Nichols, JL Lauer, M Tomoyasu, NM Russell, G Jiang, ... Journal of Applied Physics 112 (11), 2012 | 40 | 2012 |
| Effect of vacuum ultraviolet and ultraviolet Irradiation on capacitance-voltage characteristics of low-k-porous organosilicate dielectrics H Sinha, JL Lauer, MT Nichols, GA Antonelli, Y Nishi, JL Shohet Applied Physics Letters 96 (5), 2010 | 30 | 2010 |
| Effects of vacuum ultraviolet radiation on deposited and ultraviolet-cured low-k porous organosilicate glass H Sinha, GA Antonelli, G Jiang, Y Nishi, JL Shohet Journal of Vacuum Science & Technology A 29 (3), 2011 | 19 | 2011 |
| Method and system for iterative defect classification S Venkataraman, L He, JR Jordan III, O Baris, H Sinha US Patent 9,922,269, 2018 | 18 | 2018 |
| Surface potential due to charge accumulation during vacuum ultraviolet exposure for high-k and low-k dielectrics H Ren, H Sinha, A Sehgal, MT Nichols, GA Antonelli, Y Nishi, JL Shohet Applied Physics Letters 97 (7), 2010 | 15 | 2010 |
| Numerical simulation of vacuum-ultraviolet irradiation of dielectric layers H Sinha, H Ren, A Sehgal, GA Antonelli, Y Nishi, JL Shohet Applied Physics Letters 96 (14), 2010 | 15 | 2010 |
| Effect of vacuum ultraviolet and ultraviolet irradiation on mobile charges in the bandgap of low-k-porous organosilicate dielectrics H Sinha, MT Nichols, A Sehgal, M Tomoyasu, NM Russell, GA Antonelli, ... Journal of Vacuum Science & Technology A 29 (1), 2011 | 12 | 2011 |
| Method and system for defect classification L He, CHA Chen, S Venkataraman, JR Jordan III, H Ying, H Sinha US Patent 9,898,811, 2018 | 11 | 2018 |
| Reflectance and substrate currents of dielectric layers under vacuum ultraviolet irradiation H Sinha, DB Straight, JL Lauer, NC Fuller, SU Engelmann, Y Zhang, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 28 (6 …, 2010 | 10 | 2010 |
| Method and system for edge-of-wafer inspection and review X Jiang, C Sears, H Sinha, D Trease, D Kaz, W Ye US Patent 10,056,224, 2018 | 9 | 2018 |
| Effect of the dielectric–substrate interface on charge accumulation from vacuum ultraviolet irradiation of low-k porous organosilicate dielectrics H Sinha, A Sehgal, H Ren, MT Nichols, M Tomoyasu, NM Russell, Y Nishi, ... Thin Solid Films 519 (16), 5464-5466, 2011 | 7 | 2011 |
| Plasma and vacuum ultraviolet induced charging of SiO2 and HfO2 patterned structures JL Lauer, GS Upadhyaya, H Sinha, JB Kruger, Y Nishi, JL Shohet Journal of Vacuum Science & Technology A 30 (1), 2012 | 5 | 2012 |
| Systems and methods for preparation of samples for sub-surface defect review C Campochiaro, H Xiao, M Van Riet, BJT Clarke, H Sinha US Patent 9,318,395, 2016 | 3 | 2016 |
| The effects of plasma exposure on low-k dielectric materials JL Shohet, H Ren, MT Nichols, H Sinha, W Lu, K Mavrakakis, Q Lin, ... Advanced Etch Technology for Nanopatterning 8328, 94-109, 2012 | 3 | 2012 |
| Damage to low-k porous organosilicate glass from vacuum-ultraviolet irradiation JL Shohet, H Sinha, H Ren, MT Nichols, Y Nishi, M Tomoyasu, ... Damage to VUV, EUV, and X-ray Optics III 8077, 173-190, 2011 | 3 | 2011 |
| Charging response of back-end-of-the-line barrier dielectrics to VUV radiation H Sinha, JL Lauer, GA Antonelli, Y Nishi, JL Shohet Thin solid films 520 (16), 5300-5303, 2012 | 2 | 2012 |
| Additional information on J. Vac. Sci. Technol. A H Sinha, JL Shohet J. Vac. Sci. Technol. A 30, 031505, 2012 | 1 | 2012 |
| A Case Study on Software Defect Prediction R Kumar, H Sinha, A Sharad, R Sahu | | 2021 |
G. Andrew AntonelliVP of Advanced R&D, Onto Innovation, Inc.Bestätigte E-Mail-Adresse bei ontoinnovation.com
