Sven Van Elshocht
Sven Van Elshocht
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Cited by
Cited by
Strong enhancement of nonlinear optical properties through supramolecular chirality
T Verbiest, SV Elshocht, M Kauranen, L Hellemans, J Snauwaert, ...
Science 282 (5390), 913-915, 1998
Effective electrical passivation of Ge (100) for high-k gate dielectric layers using germanium oxide
A Delabie, F Bellenger, M Houssa, T Conard, S Van Elshocht, M Caymax, ...
Applied physics letters 91 (8), 2007
High-k dielectrics for future generation memory devices
JA Kittl, K Opsomer, M Popovici, N Menou, B Kaczer, XP Wang, ...
Microelectronic engineering 86 (7-9), 1789-1795, 2009
Ferroelectricity in Gd-doped HfO2 thin films
S Mueller, C Adelmann, A Singh, S Van Elshocht, U Schroeder, ...
ECS Journal of Solid State Science and Technology 1 (6), N123, 2012
Synthesis, self-assembly, and nonlinear optical properties of conjugated helical metal phthalocyanine derivatives
JM Fox, TJ Katz, S Van Elshocht, T Verbiest, M Kauranen, A Persoons, ...
Journal of the American Chemical Society 121 (14), 3453-3459, 1999
Thickness dependence of the resistivity of platinum-group metal thin films
S Dutta, K Sankaran, K Moors, G Pourtois, S Van Elshocht, J Bömmels, ...
Journal of Applied Physics 122 (2), 2017
Circular dichroism and UV− Visible absorption spectra of the Langmuir− Blodgett films of an aggregating helicene
C Nuckolls, TJ Katz, T Verbiest, SV Elshocht, HG Kuball, S Kiesewalter, ...
Journal of the American Chemical Society 120 (34), 8656-8660, 1998
Deposition of HfO2 on germanium and the impact of surface pretreatments
S Van Elshocht, B Brijs, M Caymax, T Conard, T Chiarella, S De Gendt, ...
Applied physics letters 85 (17), 3824-3826, 2004
Strontium doped hafnium oxide thin films: Wide process window for ferroelectric memories
T Schenk, S Mueller, U Schroeder, R Materlik, A Kersch, M Popovici, ...
2013 Proceedings of the European Solid-State Device Research Conference …, 2013
Atomic layer deposition of ruthenium with TiN interface for sub-10 nm advanced interconnects beyond copper
LG Wen, P Roussel, OV Pedreira, B Briggs, B Groven, S Dutta, ...
ACS applied materials & interfaces 8 (39), 26119-26125, 2016
Dielectric properties of dysprosium-and scandium-doped hafnium dioxide thin films
C Adelmann, V Sriramkumar, S Van Elshocht, P Lehnen, T Conard, ...
Applied Physics Letters 91 (16), 2007
Comparison of linearly and circularly polarized probes of second‐order optical activity of chiral surfaces
JJ Maki, T Verbiest, M Kauranen, SV Elshocht, A Persoons
The Journal of chemical physics 105 (2), 767-772, 1996
Low temperature deposition of 2D WS 2 layers from WF 6 and H 2 S precursors: impact of reducing agents
A Delabie, M Caymax, B Groven, M Heyne, K Haesevoets, J Meersschaut, ...
Chemical Communications 51 (86), 15692-15695, 2015
Quantitative determination of electric and magnetic second-order susceptibility tensors of chiral surfaces
M Kauranen, JJ Maki, T Verbiest, S Van Elshocht, A Persoons
Physical Review B 55 (4), R1985, 1997
Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
B Groven, M Heyne, A Nalin Mehta, H Bender, T Nuytten, J Meersschaut, ...
Chemistry of Materials 29 (7), 2927-2938, 2017
Estimation of fixed charge densities in hafnium-silicate gate dielectrics
VS Kaushik, BJ O'Sullivan, G Pourtois, N Van Hoornick, A Delabie, ...
IEEE Transactions on Electron Devices 53 (10), 2627-2633, 2006
HfO2 as gate dielectric on Ge: Interfaces and deposition techniques
M Caymax, S Van Elshocht, M Houssa, A Delabie, T Conard, M Meuris, ...
Materials Science and Engineering: B 135 (3), 256-260, 2006
Alternative metals for advanced interconnects
C Adelmann, LG Wen, AP Peter, YK Siew, K Croes, J Swerts, M Popovici, ...
IEEE International Interconnect Technology Conference, 173-176, 2014
Effect of hafnium germanate formation on the interface of HfO2/germanium metal oxide semiconductor devices
S Van Elshocht, M Caymax, T Conard, S De Gendt, I Hoflijk, M Houssa, ...
Applied physics letters 88 (14), 2006
Metal‐Insulator Transition in ALD VO2 Ultrathin Films and Nanoparticles: Morphological Control
AP Peter, K Martens, G Rampelberg, M Toeller, JM Ablett, J Meersschaut, ...
Advanced Functional Materials 25 (5), 679-686, 2015
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